By Kash L. Mittal
This booklet chronicles the lawsuits of the 1st overseas Symposium on Adhesion elements of skinny movies held lower than the auspices of MST meetings in Newark, New Jersey, October 28-29, 1999.
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Additional info for Adhesion Aspects of Thin Films
S. Scaglione et al. 40 Table 1. Deposition parameters of e-gun Xe ion assisted deposited hafnia thin film. E b and I b are the energy and the ion current, respectively, of Xe ion beam. 08 + , 0 , , 50 , , 100 . eV)’” Figure 3. Refractive index of HfO2 thin film at i = 310 nm for different momentum transfer parameters, P . For P values ranging between 37 and 81 (amu . eV)’/2 the deposited films show the presence of a fully crystalline structure. The whole diffraction pattern could be indexed by the Hf02 monoclinic form .
R. Guarnieri, D. S. Yee, L. J. Attanasio, J. Angilello, C. T. Wu and R. H. Hammond, J. Vac. Sci. Technol. 20, 349 (1982). Adhesion Aspects of Thin Films, Vol. 1, pp. 5 1 -65 Ed. K. L. *, STURE HOGMARK' and JENS GUNNARS ' Department of Materials Science, Uppsala Universiy, SE-751 21 Uppsala, Sweden * Det Norske Veritas, PO. Box 49306, SE-100 29 Stockholm, Sweden Abstract-Most of today's thin ceramic coatings generated by PVD or CVD techniques are in a residual stress state. This state has a number of origins and will be of either tensile or compressive nature.
Furthermore, the resulting changes in optical and mechanical properties have been primarily studied and correlated to the momentum transfer parameter. Kester and Messier  have focused their attention on structural changes besides changes in optical and mechanical properties and have concluded a more precise interpretation of the momentum transfer parameter effect. Influence of the ion bombardment on the stress in thin,fi/ms 31 Among the high index materials in the UV spectral range hafnium oxide (HfOz) is a very promising material for laser optical coatings, due to its relatively high damage threshold and good thermal and mechanical stabilities.