By Richard C. Alkire, Heinz Gerischer, Dieter M. Kolb, Charles W. Tobias
This sequence, previously edited via Heinz Gerischer and Charls V. Tobias, now edited by means of Richard C. Alkire and Dieter M. Kolb, has been warmly welcomed through scientists world-wide that's mirrored within the stories of the former volumes: 'This is an important e-book for researchers in electrochemistry; it covers components of either basic and useful significance, with studies of top of the range. the fabric is particularly good awarded and the alternative of subject matters displays a balanced editorial coverage that's welcomed.' The Analyst 'All the contributions during this quantity are good as much as the normal of this wonderful sequence and may be of significant price to electrochemists... The editors back need to be congratulated in this effective number of reviews.' magazine of Electroanalytical Chemistry and Interfacial Chemistry `...competently and obviously written.' Berichte der Bunsen- Gesellschaft für Physikalische Chemie
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Long-standing imaging is possible close to the rest potential and the etch rate is reduced by a factor of nearly 3. Compared with pure NaOH, under similar electrochemical conditions of hydrogen evolution, the main feature of the modified solution is a slower pitting of flat terraces. Whenever pitting occurs this is in the vicinity of atomic-scale defects (etch pits or terrace edges) and a more anisotropic etching process is achieved by reduction of surface pitting . Observations have been interpreted in terms of formation of a self-assembled micelle layer or Triton molecules9 standing normally to the surface, with the hydrophilic tail of the molecule facing the solution and the hydrophobic hydrocarbon chain in contact with the hydrophobic H-terminated Si surface.
In this example the interpretation of results is fairly simple because surface states are not involved. 4 - (b) 0 . -2- ---- - - - _. 6V . i__& : .. -2 tip potential V/ Pd-H Fig. 16. it - U, curves recorded with feedback loop active at n- and p+-Si(lll) in NH,F, pH = 4. The sample bias is as indicated in (a). 7 V in darkness and under illumination. When i, AFM imaging of Si in air is not easy with a high resolution, however. The force applied to the cantilever is critical for the resolution in air. Capillary forces due to some layer of moistures stick the tip on the surface and may result in surface damaging as sometimes evidenced by depressed squares on enlarged scans. The tip may also degrade on hard surfaces such as the surface of Si. Non contact mode AFM sems to allow better resolution on a large scale. Vatel et al. [I061 showed that annealing Si(100) in hydrogen reduces to 1 A the roughness of HF-treated wafers.
AFM imaging of Si in air is not easy with a high resolution, however. The force applied to the cantilever is critical for the resolution in air. Capillary forces due to some layer of moistures stick the tip on the surface and may result in surface damaging as sometimes evidenced by depressed squares on enlarged scans. The tip may also degrade on hard surfaces such as the surface of Si. Non contact mode AFM sems to allow better resolution on a large scale. Vatel et al. [I061 showed that annealing Si(100) in hydrogen reduces to 1 A the roughness of HF-treated wafers.